We have developed a variety of processes to transfer block copolymer microdomain patterns into functional materials. The block copolymer can be used as an etch mask directly, or used to pattern a hard mask such as tungsten which is then used as an ion beam etch mask for patterning magnetic films. Another approach is to deposit metal over the block copolymer pattern and liftoff, and a third process is similar to Damascene patterning in which a film is deposited over the block copolymer pattern then etched back. A wide range of materials has been patterned including magnetic films and multilayers, oxides, other polymers, and 2D materials.
Pattern transfer from a block copolymer into a Co layer to form a dot array